Japanese photoresist makers validate metal oxide resist lines for High-NA EUV chipmaking
JSR, TOK and Adeka advance inorganic patterning materials as leading foundries test sub-2nm lines on ASML 0.55 NA scanners.
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All companies →Tokyo Ohka Kogyo
Every EAB briefing that touches Tokyo Ohka Kogyo — capital spending, plants, M&A, earnings and policy exposure. 1 briefing.
- First seen
- August 30, 2026
- Latest
- August 30, 2026
- With a linked document
- 1 of 1
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- 1
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- Semiconductors (1)